Plasma Surface Processing and Thin Film Engineering: Enhancing Material Performance Through Coating, Deposition, Functionalization Technologies

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Description (1)

Pages: 249, Paperback, Independently published

Product specifications

Brand Independently Published
EAN
  • 9798197395061

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Elsevier

Plasma Processing for Semiconductor Materials and Thin Film Devices (Vacuum Deposition Technologies)

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Surface Chemistry in Mineral Processing Engineering: For Processing, Material and Engineering

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Academic Press

Plasma Sources for Thin Film Deposition and Etching (ISSN Book 18)

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Handbook of Thin Film Deposition Processes and Techniques (Materials Processing Technology)

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