Principles and Practice of Thin-Film Deposition: Fundamentals, Process Engineering, Industrial Applications PVD, CVD, ALD, Sputtering Technologies

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Description (1)

Pages: 388, Paperback, Independently published

Product specifications

Brand Independently Published
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  • 9798186673842

Nova Science Publishers Inc

Atomic Layer Deposition (ALD): Fundamentals, Characteristics & Industrial Applications (Chemical Engineering Methods and Technology)

£ 95.80
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Woodhead Publishing

Nanostructured Thin Film Deposition by Sputtering: From Fundamentals to Applications (Woodhead Publishing...

£ 129.39
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Wiley

Radio Frequency Sputtering: Thin-Film Deposition and Device Applications

£ 135.00
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William Andrew

Handbook of Chemical Vapor Deposition: PRINCIPLES, Technology AND Applications (CVD : TECHNOLOGY, APPLICATIONS)

£ 71.89
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