Plasma Surface Processing and Thin Film Engineering: Enhancing Material Performance Through Coating, Deposition, Functionalization Technologies

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Description (1)

Pages: 252, Hardcover, Independently published

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Brand Independently Published
EAN
  • 9798197395849

Elsevier

Plasma Processing for Semiconductor Materials and Thin Film Devices (Vacuum Deposition Technologies)

£ 274.99
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Academic Press

Plasma Sources for Thin Film Deposition and Etching (ISSN Book 18)

£ 35.19
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William Andrew

Handbook of Thin Film Deposition Processes and Techniques (Materials Processing Technology)

£ 135.04
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LAP LAMBERT Academic Publishing

Surface Chemistry in Mineral Processing Engineering: For Processing, Material and Engineering

£ 35.00
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